Simulation of Quantum Dot Formation Using Finite Element Method

Abstract

In this work, we employed the finite element method to study various effects on a thin film system such as the surface energy contribution, the elastic strain energy contribution, and the bulk free energy contribution. We found that the surface energy causes the film to remain flat while the strain energy term promotes an increase in amplitude of surface modulation. The elastic energy also causes evaporation and the bulk free energy term was introduced to model vapor deposition. With these contributions, we were able to simulate quantum dot behavior during their formation.

Members

Haicheng Guo (guohc@umich.edu)

Feng Li (umfengli@umich.edu)

Nirand Pisutha-Arnond (nirand@umich.edu)

Danqing Wang (wdq@umich.edu)

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