What I do

I am a PhD candidate in Electrical Engineering at the University of Michigan. My research focus is on nanoimprint lithography (NIL). NIL is the process of transferring nanometer scale patterns to a substrate through direct, physical contact, such as molding. These transferred patterns can then be used lithographically in subsequent processing, such as etching.

With proper engineering, NIL has been shown to transfer patterns down to tens of nanometers. Reliable nanometer scale pattern generation methods are slow (e-beam writing, which takes days to complete). NIL is a rapid process that preserves the originating mold. Coupled with an affordable pattern generation technique, NIL can realize a fast and cheap nanopatterning system. This is favorable compared to EUV photolithography, which costs an estimated $50 million per machine.

Much of my labwork is conducted in the Solid State Electronics Laboratory, UM’s flagship cleanroom. It’s quite large and well-equipped, and messes up my hair.

Journal Publications:

Choi, P.; Fu, P. F.; and Guo, L. J., “Siloxane Copolymers for Nanoimprint Lithography,” Advanced Functional Materials, 2007, 17, 65.

Conference Publications:

Choi, P.; Kim, J.; and Guo, L. J., “Fabrication of Synthetic Gecko Tape and Characterization of Adhesion Forces,” Fiftieth International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Baltimore, May 30-June 2 2006.

Fu, P. F.; Choi, P.; Pina, C.; Cheng, X.; and Guo, L. J., “Development of New Polymer Resists for Nanoimprint Application,” Invited, 231st ACS National Meeting, Atlanta, March 2006.

Fu, P. F.; Cheng, X.; Pina, C.; Choi, P.; Fung, W.; and Guo, L. J., “Spin-On UV and Thermal-Curable Liquid Resist for Nanoimprint Application,” Invited, MRS Fall Meeting, Boston, November 2005.

Choi, P.; Fu, P. F.; and Guo, L. J., “Siloxane Copolymers for Nanoimprint Lithography,” Forty-Ninth International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Orlando, May 31-June 3 2005.

Choi, P.; Fu, P. F.; Cheng, X.; and Guo, L. J., “New Polymer Resists for Nanoimprint Lithography,” Third International Conference on Nanoimprint and Nanoprint Technology, Vienna, Austria, December 1-3 2004.

Research Group

My advisor is Professor L. Jay Guo, at the University of Michigan. A primary interest of our group is nanoimprinting.

Teaching

I have been a teaching assistant for several courses in the Electrical Engineering Department:

• EECS 425: Integrated Microsystems Laboratory
• EECS 320: Introduction to Semiconductor Devices
• EECS 314: Electronic Circuits, Systems, and Applications
• EECS 414: Introduction to Micro Electromechanical Systems

Below, from EECS 425 Winter 2007, a video I cut of all the really cool projects!